This research group uses well-equipped facilities that are built around four laboratories: the Optical Communications Lab, the Sensors Lab, the Photonics Lab, and the Teralab. The computing and simulation facilities include more than 50 high-end computers that run software for electrical (microwave) and lightwave devices design as well as optical networks and systems simulation. In terms of instrumentation, a wide variety of electrical and lightwave measurements are available. Novel devices and subsystems can also be fully characterised using the wide range of electrical and lightwave components in the labs.

The non-consumable equipment available from own contributions and other organizations is:

K675XD Turbo Sputter Coater

The K675XD System employs Dual magnetron target assemblies, which enhance the efficiency of the process using low voltages, and giving a fine grain, cool sputtering.

• An integral shutter and stage assembly is fitted as standard that allows a sputter cleaning and the sputter coating cycle to be carried out sequentially while maintaining the vacuum.
• It can be used to sputter coat targets such as Gold, and also targets that may need precleaning for the removal of oxide layers, such as Chromium.



• K675XD features a rotating sample table / shutter support arm which ensures even depositions. This method allows standard targets to be utilised, and avoids the necessity of special large profile targets.
• The dual shutter assembly to facilitate sputter cleaning of Oxidising targets and preventing cross contamination of targets
• It features a turbo-molecular pump backed by a rotary vacuum pump.
• The Instrument is fitted with two 54mm diameter quick-change targets giving optimum consumable cost performance. Alternative target materials are available.
• The integrated Instrument panel and plug-in electronics maximise 'up-time' and, with userfriendly designs, ensures satisfactory multi-user discipline.
• The sputtering parameters for each target can be pre-set.
• The gas bleed needle valve can be pre set and has electromagnetic valve back-up.



• The independent vacuum pump is controlled by the
• An integral shutter and stage assembly is fitted as standard that allows a sputter cleaning and the sputter coating cycle to be carried out sequentially while maintaining the vacuum.
• It can be used to sputter coat targets such as Gold, and also targets that may need precleaning for the removal of oxide layers, such as Chromium.
• K675XD features a rotating sample table / shutter support arm which ensures even depositions. This method allows standard targets to be utilised, and avoids the necessity of special large profile targets.
• The dual shutter assembly to facilitate sputter cleaning of Oxidising targets and preventing cross contamination of targets
• It features a turbo-molecular pump backed by a rotary vacuum pump.
• The Instrument is fitted with two 54mm diameter quick-change targets giving optimum consumable cost performance. Alternative target materials are available.
• The integrated Instrument panel and plug-in electronics maximise 'up-time' and, with userfriendly designs, ensures satisfactory multi-user discipline.
• The sputtering parameters for each target can be pre-set.
• The gas bleed needle valve can be pre set and has electromagnetic valve back-up.
• The independent vacuum pump is controlled by the Instrument throughout the fully automatic coating cycle.
• The system is also fitted with a film thickness monitor (FTM)
• The system is fitted with a vacuum shutdown feature allowing the instrument to be pumped down and switched off, and the chamber left under vacuum.

Volver